Thickness Measurement of Thin Film on Polycrystalline Preferred Orientation Material by X-Ray Diffraction

Thickness measurement based on the absorption of X-rays in film had been tested on polycrystalline substrate using X-ray diffraction. The diffraction angle (2θ) had fixed and incidence angles had changed continuously during collection data. The intensity of substrate reflection was measured to count the thickness of film. The result indicated the preferred orientation of substrate was effective on the account observably. A technique was found to correct the effect of preferred orientation.