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    MA Hai-quan, LI Bei, HE You-du, MI Gang, WANG Hong-xun, SHI Yi-wei. Application of Metal Intensifying Screen to the Double-film Technology with Equal Exposure Sensitivity[J]. Nondestructive Testing, 2016, 38(1): 17-19. DOI: 10.11973/wsjc201601005
    Citation: MA Hai-quan, LI Bei, HE You-du, MI Gang, WANG Hong-xun, SHI Yi-wei. Application of Metal Intensifying Screen to the Double-film Technology with Equal Exposure Sensitivity[J]. Nondestructive Testing, 2016, 38(1): 17-19. DOI: 10.11973/wsjc201601005

    Application of Metal Intensifying Screen to the Double-film Technology with Equal Exposure Sensitivity

    • In the present work, with the film sensitivity and film density as evaluation parameters, the combination patterns of double-film technology with metal intensifying screen were studied with titanium alloy step blocks. The results show that in accordance with the regulation of HB/Z60《Radiographic Inspection》, for the parts of thickness being less than 42mm :if the maximum and minimum thickness ration of detected part is less than 5.5,the combination pattern of MX125MX125 can be used, if the ration is less than 3.0, the combination pattern of MX125,MX125 and AA400AA400 can be used.
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